Study on Estimation of Device Yield in Non-Epitaxial 4H-SiC Material Relating to Defect Densities Influencing Bipolar Degradation with XRT- Measurements
نویسندگان
چکیده
Commercially available 4H-SiC substrate quality has improved over time, and this extensively reduced defect concentration in the active epitaxial layer, during epi growth conditions at interface. The objective of work is to investigate bulk crystal for purpose future vertical power device fabrication exfoliated, non-epitaxial, undoped material layers. Mathematical estimations on yield fraction, that immune bipolar degradation suggested process were calculated based XRT measurements detect BPD TSD densities donor substrates. full wafer density maps on-axis semi-insulating substrates from two vendors compared.
منابع مشابه
Identification and carrier dynamics of the dominant lifetime limiting defect in n 4H-SiC epitaxial layers
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ژورنال
عنوان ژورنال: Solid State Phenomena
سال: 2023
ISSN: ['1662-9787', '2813-0936', '1662-9779', '1012-0394']
DOI: https://doi.org/10.4028/p-qymc38