Study on Estimation of Device Yield in Non-Epitaxial 4H-SiC Material Relating to Defect Densities Influencing Bipolar Degradation with XRT- Measurements

نویسندگان

چکیده

Commercially available 4H-SiC substrate quality has improved over time, and this extensively reduced defect concentration in the active epitaxial layer, during epi growth conditions at interface. The objective of work is to investigate bulk crystal for purpose future vertical power device fabrication exfoliated, non-epitaxial, undoped material layers. Mathematical estimations on yield fraction, that immune bipolar degradation suggested process were calculated based XRT measurements detect BPD TSD densities donor substrates. full wafer density maps on-axis semi-insulating substrates from two vendors compared.

برای دانلود باید عضویت طلایی داشته باشید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Solubility limit and precipitate formation in Al-doped 4H-SiC epitaxial material

Heavily Al-doped 4H–SiC structures have been prepared by vapor phase epitaxy. Subsequent anneals have been carried out in an Ar atmosphere in a rf-heated furnace between 1500 °C and 2000 °C for 0.5 to 3 h. Secondary ion mass spectrometry has been utilized to obtain Al concentration versus depth as well as lateral distributions ~ion images!. Transmission electron microscopy ~TEM! has been employ...

متن کامل

Structure of “star” defect in 4H-SiC substrates and epilayers

The structure of the “star” defect in 4H-SiC substrates and its effects on the extended defect structures in the epilayers were studied by molten KOH etching and transmission x-ray topography. Star defects consist of a center region with high densities of threading dislocations (both edge and screw types) and six arms of dislocation arrays extending along <11-20> directions. In addition, multip...

متن کامل

Divacancy in 3C- and 4H-SiC: An extremely stable defect

Rights: © 2002 American Physical Society (APS). This is the accepted version of the following article: Torpo, L. & Staab, T. E. M. & Nieminen, Risto M. 2002. Divacancy in 3Cand 4H-SiC : An extremely stable defect. Physical Review B. Volume 65, Issue 8. 085202/1-10. ISSN 1550-235X (electronic). DOI: 10.1103/physrevb.65.085202, which has been published in final form at http://journals.aps.org/prb...

متن کامل

The carbon vacancy related EI4 defect in 4H-SiC

Electron paramagnetic resonance (EPR) was used to study high-purity semi-insulating 4H-SiC irradiated with 2 MeV electrons at room temperature. The EPR signal of the EI4 defect was found to be dominating in samples irradiated and annealed at ~750°C. Additional large-splitting Si hyperfine (hf) lines and also other C and Si hf structures were observed. Based on the observed hf structures and ann...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

ژورنال

عنوان ژورنال: Solid State Phenomena

سال: 2023

ISSN: ['1662-9787', '2813-0936', '1662-9779', '1012-0394']

DOI: https://doi.org/10.4028/p-qymc38